Maskless Lithography

نویسندگان
چکیده

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Lossless Compression Techniques for Maskless Lithography Data

Future lithography systems must produce more dense chips with smaller feature sizes, while maintaining the throughput of one wafer per sixty seconds per layer achieved by today’s optical lithography systems. To achieve this throughput with a direct-write maskless lithography system, using 25 nm pixels for 50 nm feature sizes, requires data rates of about 10 Tb/s. In a previous paper, we present...

متن کامل

Micro-mirror Arrays for Maskless Lithography

This paper presents a design approach for fabricating an array of MEMS mirrors suitable for maskless lithography applications in a commercial CMOS process. A small footprint mirror design is presented which uses a pair of support beams for signal routing and diagonal gap-closing actuators for mirror deflection. The actuators are shown to be capable of delivering up to 10nN of force per micron o...

متن کامل

Maskless Plasmonic Lithography at 22 nm Resolution

Optical imaging and photolithography promise broad applications in nano-electronics, metrologies, and single-molecule biology. Light diffraction however sets a fundamental limit on optical resolution, and it poses a critical challenge to the down-scaling of nano-scale manufacturing. Surface plasmons have been used to circumvent the diffraction limit as they have shorter wavelengths. However, th...

متن کامل

Lossless Layout Compression for Maskless Lithography Systems

Future lithography systems must produce more dense chips with smaller feature sizes, while maintaining throughput comparable to today’s optical lithography systems. This places stringent data-handling requirements on the design of any maskless lithography system. Today’s optical lithography systems transfer one layer of data from the mask to the entire wafer in about sixty seconds. To achieve a...

متن کامل

Data Handling Issues in Maskless Lithography

Future Maskless Lithography systems will require high throughput circuitry to interface to the writers. Previous works have demonstrated architectures for LZ decompression architectures to decrease chip pin count [1]. In this work we will compare compression done systolically and non-systolically at the circuit level. Furthermore, we analyze different techniques to get the data to the writers a...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Nanoindustry Russia

سال: 2018

ISSN: 1993-8578

DOI: 10.22184/1993-8578.2018.82.200.202